X-Ray Photoelectron Spectroscopy (XPS)
PHI 5000 VersaProbe III Scanning ESCA Microprobe
- Scanning AUGER (<100 nm), SEM/SXI for elemental composition and chemical mapping
- High/low temperature (-140°C to 600°C) stage
- Heating sample holder (up to 800°C)
- High Pressure reactor operating under flow of gas mixtures having desired composition (on prep arm)
- The gas reactor has the H/C platen with heating to 800°C in static mode (1 bar) or in vacuum, and up to 500°C with continuous gas flow at maximum pressure of 2 bars
System Components
- Feed block: MFC's, sampling valves & transfer lines
- XPS: PHI 5000 VersaProbe III Scanning ESCA Microprobe
- Analysis block: Mass spectrometer and switching manifold
- Analysis Mode: In situ/semi-operando
Analysis Examples
- Determination of electronic properties/oxidation levels of metallic active sites of catalysts, adsorbents, supports and materials
- Determination of surface concentrations of materials; investigation of changes in concentration along a line on the surface and with depth into the material/particle (depth profiling)
Parametric Use Cases
- The investigation of changes on the electronic properties/oxidation states of metallic active sites, support materials, solid materials during in situ pre-treatment (calcination, reduction) and specific gas-phase reactions depending on conditions applied (such as feed gas mixture composition, temperature and pressure)
- Semi-operando investigation of the effects of changes in the electronic properties/oxidation states of active metal(lic) sites of the catalyst on its performance (activity, selectivity) to establish structure-activity relation
